中文簡介

《電子光譜學(xué)及相關(guān)現(xiàn)象雜志》發(fā)表了在電子光譜學(xué)和電子結(jié)構(gòu)領(lǐng)域的實(shí)驗(yàn)、理論和應(yīng)用工作，涉及在研究中使用高能光子（>10eV）或電子作為探針或檢測(cè)粒子的技術(shù)。該雜志鼓勵(lì)在原子、分子、離子、液體和固體光譜的一般領(lǐng)域做出貢獻(xiàn)，這些領(lǐng)域使用電子沖擊、同步輻射（包括自由電子激光器）和短波長激光器。論文采用光發(fā)射和其他技術(shù)，其中同步輻射，自由電子激光器，實(shí)驗(yàn)室激光器或其他電離輻射源，結(jié)合電子速度分析特別受歡迎。所討論的材料特性包括基態(tài)和激發(fā)態(tài)特性以及時(shí)間分辨電子動(dòng)力學(xué)。電子光譜學(xué)的獨(dú)立技術(shù)包括外層和內(nèi)層的光電子光譜學(xué)；逆光電發(fā)射；spin-polarised光電發(fā)射；時(shí)間分辨雙光子光發(fā)射、共振和非共振俄歇光譜包括離子中和研究；邊緣技術(shù)(EXAFS, NEXAFS，…)，共振和非共振非彈性x射線散射(RIXS)，光譜顯微鏡，高分辨率電子能量損失光譜；電子散射和共振電子俘獲；電子光譜學(xué)與顯微技術(shù)的結(jié)合；潘寧電離光譜包括掃描隧穿光譜；光發(fā)射、x射線發(fā)射、螺旋鉆、能量損失和彭寧電離過程的理論處理。也歡迎在儀器儀表和技術(shù)發(fā)展、數(shù)據(jù)采集-分析-量化方面作出貢獻(xiàn)。涉及的主題領(lǐng)域包括材料和工藝的光譜特性，涉及：-表面、界面和薄膜；-原子和分子物理學(xué)，團(tuán)簇；-半導(dǎo)體物理化學(xué)；-光伏材料；-材料科學(xué)包括：金屬表面、納米顆粒、陶瓷、強(qiáng)相關(guān)系統(tǒng)、聚合物、生物材料和其他有機(jī)薄膜；-催化。

　　英文簡介

The Journal of Electron Spectroscopy and Related Phenomena publishes experimental, theoretical and applied work in the field of electron spectroscopy and electronic structure, involving techniques which use high energy photons (>10 eV) or electrons as probes or detected particles in the investigation.The journal encourages contributions in the general area of atomic, molecular, ionic, liquid and solid state spectroscopy carried out using electron impact, synchrotron radiation (including free electron lasers) and short wavelength lasers. Papers using photoemission and other techniques, in which synchrotron radiation, Free Electron Lasers, laboratory lasers or other sources of ionizing radiation, combined with electron velocity analysis are especially welcome. The materials properties addressed include characterization of ground and excited state properties as well as time resolved electron dynamics.The individual techniques of electron spectroscopy include photoelectron spectroscopy of both outer and inner shells; inverse photoemission; spin-polarised photoemission; time resolved 2-photon photoemission, resonant and non-resonant Auger spectroscopy including ion neutralization studies; edge techniques (EXAFS, NEXAFS,...) , resonant and non-resonant inelastic X-ray scattering (RIXS), spectro-microscopy, high resolution electron energy loss spectroscopy; electron scattering and resonance electron capture; electron spectroscopy in conjunction with microscopy; penning ionization spectroscopy including scanning tunneling spectroscopy; theoretical treatments of the photoemission, X-ray emission, Auger, energy loss and Penning ionization processes. Contributions on instrumentation and technique development, date acquisition - analysis - quantification are also welcome.Subject areas covered include spectroscopic characterization of materials and processes concerning:- surfaces, interfaces, and thin films;- atomic and molecular physics, clusters;- semiconductor physics and chemistry;- materials for photovoltaics;- materials science including: metal surfaces, nanoparticles, ceramics, strongly correlated systems, polymers, biomaterials and other organic films;- catalysis

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